摘要
采用光刻热熔法及离子束溅射刻蚀制作面阵石英柱微透镜阵列．表面探针和扫描电子显微镜的测试表明，在不同的工艺条件下制成的柱微透镜的表面轮廓具有明显的差异，给出了描述柱微透镜制作过程中的几个重要工艺参量的拟合关系式．
The microlens quartz array in cylinder is fabricated by phodtolithography and Ar ion beam etching. Surface stylus measurement and scanning electron microscopy (SEM) show that the surface difference between the photoresist masks of the cylinder shapes and the quartz microlens arrays prepared at different etching conditions are clear. The experimenting relations between the several important parameters and the Ar ion beam enegy are given.
出处
《华中理工大学学报》
CSCD
北大核心
1998年第A02期7-9,共3页
Journal of Huazhong University of Science and Technology
