摘要
利用扫描电子显微镜（ＳＥＭ）和表面探针测试，分析了采用离子束溅射刻蚀技术制作的石英微透镜阵列器件的表面微观形貌，讨论了引起微透镜表面缺陷的原因及所采取的改善表面形貌的措施，研究了采用不同层次的光致抗蚀剂微透镜图形的固化技术后，经离子束溅射刻蚀制作出的微透镜阵列器件的表面形貌差异，定性给出了表面探针测试的适用范围，此外还介绍了对所制样品所做的几项主要的处理操作。
Using scanning electron microscopy (SEM) and surface style measurement.We have investigated the surface microstructure and morphology of the rectangular arch quartz microlens array fabricated by Ar ion beam etching. The reason induced the surface defect of quartz microlens has been discussed. The methods improving surface microstructure and morphology have been analyzed,The surface morphology differences of the microlens devices fabricated by ion beam etching under the different conditions have been given.In addition,we also introduce several key operations to the quartz samples prepared. The process for preparing quartz microlens has been discussed.
出处
《光学精密工程》
EI
CAS
CSCD
1997年第5期63-68,共6页
Optics and Precision Engineering
