摘要
采用常规的光刻热熔法及灰度掩模技术 ,结合离子束蚀刻与溅射制作面阵非梯度折射率型平面折射和平面衍射微透镜 ,定性分析了不同的工艺条件下所得到的平面端面微光学器件的种类和形貌特征 ,给出了在石英衬底表面通过光刻热熔工艺和氩离子束蚀刻所得到的两种球面及圆弧轮廓特征的面阵凹形掩模的表面探针测试曲线 ,对平面微透镜阵列与IRCCD成像芯片和半导体激光器阵列的集成结构作了初步分析。
Large-area planar non-gradient-reftactiye-index refractive and diffractive microlens arrays fabricated by common thermal treatment method, gray-scale mask technique and ion beam etching and sputtering are discussed. The microstructure and microappearance of several microoptics deveces with planar face fabricated in different processing conditions ars analyzed qualitatively. Surface probe measurements are carried out to determine the dimension and the surface morphology of both large-area concave mask structures with sphere and arc outlines on quartz substrate fabricated by melting method and argon ion beam etching. The integrated structures, such as planar microlens array/IRCCD imaging chip and planar microlens array/semiconductor laser array, are studied briefly.
出处
《微细加工技术》
2001年第2期76-80,共5页
Microfabrication Technology
基金
2000年中国博士后科学基金资助项目
湖北省自然科学基金资助项目! (2 0 0 0J150 )
关键词
非梯度折射率
平面微透镜阵列
离子束蚀刻
溅射
光刻
non-gradient refractive index
planar microlens array
ion beam erching and sputtering
