摘要
综述了近几年国内外在薄膜制备技术方面的研究进展,着重比较了蒸发沉积、溅射沉积、激光沉积、CVD、MBE和Sol Gel等技术的优缺点,分析了这些技术在薄膜制备中应用前景。
The research progress in thin films preparation technology in recent years are summarized , the characteristics and relative merits of these preparation methods, such as evaporation deposition, sputtering deposition, laser ablation, CVD, MBE, and SolGel, have been analyzed and stressed. The application prospects for thin films preparation technology are also reviewed.
出处
《真空电子技术》
2003年第5期65-70,共6页
Vacuum Electronics
关键词
薄膜
制备技术
研究进展
Thin films
Preparation technology
Research progress
