摘要
分别采用电子束蒸镀、离子束辅助沉积、离子束反应辅助沉积、双离子束溅射技术制备了二氧化铪薄膜,研究了薄膜的光学特性、缺陷、残余应力、弱吸收和抗激光损伤阈值.发现离子束反应辅助沉积的二氧化铪薄膜具有低的缺陷密度和高的损伤阈值;双离子束溅射的二氧化铪薄膜具有高的折射率、高的残余应力和低的损伤阈值.对二氧化铪薄膜的损伤阈值与上述特性之间的依赖关系进行了讨论,发现残余应力是影响薄膜抗激光损伤阈值的一个重要原因.
HfO2 thin films were prepared by electron-beam evaporation(EBE),ion-beam-assisted deposition(IBAD),ion-beam reactive assisted deposition(IBRAD) and dual-ion-beam sputtering deposition(DIBSD).Optical properties,surface defect,residual stress,weak absorption and laser induced damage threshold(LIDT) were investigated.It was found that the HfO2 film deposited by DIBSD had lower nodular defect densities and higher LIDT;the HfO2 film deposited by DIBSD showed higher refraction,higher residual stress and lower LID...
出处
《华中科技大学学报（自然科学版）》
EI
CAS
CSCD
北大核心
2007年第S1期108-111,共4页
Journal of Huazhong University of Science and Technology(Natural Science Edition)
基金
国家高技术研究发展计划资助项目(2001AA312100)
中国科学院光电集团资助项目(KGCX2-405)
关键词
二氧化铪薄膜
激光损伤阈值
物理汽相沉积
HfO2 thin film
laser induced damage threshold
physical vapor deposition
