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微波ECR等离子体辅助反应蒸发沉积ITO膜 被引量:9

ITO Thin Film Deposition by ECR Plasma Enhaced Reactive Evaporation
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摘要 发展了一种新型的微波电子回旋共振等离子体(ECR)辅助反应蒸发沉积薄膜的方法,并且使用它成功地在低气压(10 ̄(-2)Pa)、低温基片(30~100℃)上,不作后处理,直接制备出了附着力强,透光率高于85%,方阻低于100Ω/□的ITO膜。 Conductive and transparent indium tinoxide(ITO)thin films were prepared by an enhacedreactive deDOsition with microwave electron cvclotronresonant plasma。 During deposition low oxygenDressure(10 ̄(-2)pa)and low substrate temDeratures(30-100℃)were used.The films had goodadhesion,low sheet resistance(<100Ω/□).andhigh optical transmmitance (>85%)。
出处 《功能材料》 EI CAS CSCD 1995年第5期405-408,共4页 Journal of Functional Materials
基金 江苏省科委 教委自然科学基金
关键词 ITO膜 微波 ECR等离子体 真空蒸发 ITO Film,microwave ECR Plasma,Vacuum Deposition
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