摘要
采用直流溅射并结合热处理工艺制备氧化镍薄膜,利用X射线衍射仪(XRD)、扫描电镜(SEM)、能谱仪(EDX)考察退火温度对薄膜结构、形貌和组成的影响,并通过恒流充放电技术初步考察薄膜的电化学性能。结果表明,在400～500℃退火温度下制备了表面光滑、结构致密的NiO薄膜;随着退火温度的升高,薄膜的晶粒尺寸逐渐增大,晶形趋于完整;其中,500℃下退火2h获得的NiO薄膜具有良好的电化学循环稳定性,有望成为高性能的全固态薄膜锂电池阳极材料。
Nickel oxide thin film was prepared by direct-current reactive sputtering with heat treatment assist process. The influence of annealing temperature on its surface morphology, composition and structure was studied by using of XRD, SEM and EDX. Furthermore, the electrochemistry performance of NiO thin film was preliminary examined through the constant current charge-discharge technique. The results indicate that the dense NiO thin film with smooth surface is ob- tained when annealed at 400 - 500 ℃ for 2 h. With the increase of annealing temperature, the thin film particle size in- creases, the particle size is 10 - 60 nm. The NiO thin film annealed at 500 ℃ for 2 h has superior electrochemical eye- ling properties and expected to become high-performance anode material for all-solid-state thin film lithium ion battery.
出处
《金属热处理》
CAS
CSCD
北大核心
2008年第8期64-66,共3页
Heat Treatment of Metals
基金
河南科技大学人才科研基金项目(04015)
河南科技大学青年科研基金项目(2004QN010)
关键词
氧化镍薄膜
直流溅射
电化学性能
NiO thin film
direct-current sputtering
electrochemical properties
