摘要
对微电子工艺中引入杂质的危害进行了阐述,找出现有硅溶胶距离实际应用的不足,发掘其纯化工艺,为微电子用硅溶胶的广泛应用提供了前提条件。
The harm of impurity introduced to the technique of microelectronics is recited. The shortage of silica sols is found, The technique of purification is put forward. And this is the premise for the wide application of silica sols.
出处
《半导体技术》
CAS
CSCD
北大核心
2005年第9期17-19,共3页
Semiconductor Technology
关键词
硅溶胶
纯化
杂质
silica sols
purification
impurity
