摘要
用电子束反应蒸发法制备了TiO2薄膜,以折射率和消光系数为主要性能指标,通过正交实验法确定了得到较优光学性能的工艺搭配。分析了基片温度、沉积速率和真空度对TiO2薄膜光学性能的影响。并通过所开发的膜系设计软件分析了在最佳工艺条件下制备的TiO2薄膜的透射率,用包络线法计算出了薄膜的折射率、厚度以及消光系数,与实测值有很小的差别,可以证明实测结果的正确性。
The optimum technique parameters with better optical properties is established by the orthogonal experiment with refraction index and extinction coefficient referred to as the main property index, during which TiO2 film is produced by electric beam evaporation. Influence from technological conditions (temperature of substrate, deposition rate, chamber vacuum) on optical properties of TiO2 film is discussed. The transmission spectrum of the TiO2 film prepared in the best technological conditions by the film design software is analyzed and the refractive index and extinction coefficient as well as the thickness are calculated by the envelope method. Little discrepancy exists between the calculated value and the measured value, which demonstrates the accuracy of the measured value and authenticity of the conditions.
出处
《武汉理工大学学报（信息与管理工程版）》
CAS
2003年第5期73-76,共4页
Journal of Wuhan University of Technology：Information & Management Engineering
