期刊文献+

(1-x)TiO_2-xTa_2O_5薄膜的光学性能研究 被引量:1

Optical Properties of (1-x)TiO_2—xTa_2O_5 Thin Films
在线阅读 下载PDF
导出
摘要 TiO_2-Ta_2O_5薄膜是较新颖的光学薄膜,由均匀混合的两种化合物薄膜材料作为膜料研制而成,本文采用离子辅助蒸发的方法,以不同配比的Ta_2O_5和TiO_2混合物为初始膜料在K_9玻璃上制备了TiO_2-Ta_2O_5混合薄膜,并对其光学性能进行研究。实验结果表明,TiO_2-Ta_2O_5薄膜在可见光范围内有较高的透射率,消光系数在10-3~10-4数量级,折射率在1.80~2.07范围内变化(550nm),是理想的光学镀膜材料。随着Ta_2O_5含量从0增加到20%,光学带隙从3.266eV单调增加到3.417eV,并用Kayanuma提出的模型解释了透射谱中吸收边的漂移现象。 TiO2-Ta2O5 thin films are new-style optical thin films which are made of mixed compounds as starting material. The TiO2-Ta2O5 compound thin films were fabricated by ion beam assisted deposition on K9 glasses with Ta2O5 and TiO2 of different proportioning as starting materials, and the optical properties were investigated. The testing results show that TiO2-Ta2O5 thin films have the higher transmittance and the lower extinction coefficient at visible light wavelength, and the refractive index varies from 1.80 to 2.07(550nm). TiO2-Ta2O5 thin films are of great significance in optical fields. The optical band gap of TiO2-Ta2O5 films increase from 3.266eV to 3.417eV while the content of Ta2O5 enhances from 0 to 20%, and the shift of absorption edges in transmittance spectrum is explained by Kayanuma model.
出处 《光电工程》 EI CAS CSCD 北大核心 2008年第3期84-87,共4页 Opto-Electronic Engineering
关键词 薄膜 TiO2-xTa2O5 透射率 光学常数 光学带隙 thin films TiO2-Ta2O5 transmittance optical constant optical band gap
  • 相关文献

参考文献9

  • 1王学华,薛亦渝.温度条件对反应电子束蒸发制备TiO_2薄膜结构和性能的影响[J].应用光学,2004,25(2):55-57. 被引量:7
  • 2Cevro M. Ion-beam sputtering of(Ta2O5)x-(SiO2)1-x composite thin films[J]. Thin Solid Films, 1995, 258: 91-103.
  • 3Darko Makovec, Jian-Min Zuo, Ray Twesten, et al. A high-temperature structure for Ta2O5 with modulations by TiO2 substitution[J]. Journal of Solid State Chemistry, 2006, 179: 1782-1791.
  • 4Swanepoel R. Determination of the thickness and optical constants of amorphous silicon[J]. J Phys E: Sci Instrum, 1983, 16: 1214-1222.
  • 5夏志林,薛亦渝,赵利,张幼陵.基于包络线法的薄膜光学常数分析[J].武汉理工大学学报(信息与管理工程版),2003,25(5):73-76. 被引量:14
  • 6Corbella C, Vives M, Pinyol A, et al. Influence of the porosity of RF sputtered Ta205 thin films on their optical properties for electrochromic applications[J]. Solid State Ionics, 2003, 165: 15-22.
  • 7Never Kaliwoh, Jun-Ying Zhang, Ian W Boyd. (TazOs)1-x(TiO2)x deposited by photo-induced CVD using 222nm excimer lamps[J]. Applied Surface Science, 2002, 186: 246-250.
  • 8Chen J Y, Leng Y X, Tian X B, et al. Antithrombogenic investigation of surface energy and optical bandgap and hemocompatibility mechanism of Ti(Ta^+5)O2 thin films[J]. Biomaterials, 2002, 23: 2545-2552.
  • 9Ekimov A I, Efros A L, Onushchenko AA. Quantum size effect in semiconductor microcrystals[J]. Solid State Commun, 1985, 56(11): 921-924.

二级参考文献3

共引文献19

同被引文献12

引证文献1

二级引证文献4

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部