摘要
在玻璃衬底上采用等离子体增强的化学气相沉积(PECVD)法制备了非晶硅薄膜(A-Si:H)。用紫外-可见-近红外分光光度计测出了其透射光谱。采用模拟退火算法研究了透射光谱,得出了薄膜的厚度、折射率和吸收系数随波长变化的关系式、光学带隙等光学常数,并对该方法的优缺点进行了讨论。
A-Si：H film is deposited on glass by plasma enhanced chemical vapor deposition（PECVD）.Transmission spectra of the film are measured by the UV-VIS-NIR spectrophotometer.Thickness,reflection index,absorption coefficient and optical band gap of the film are obtained by studying the transmission spectra using simulated annealing algorithm,the advantages of this method are discussed.
出处
《光学技术》
CAS
CSCD
北大核心
2009年第4期492-495,共4页
Optical Technique
