摘要
研究了椭偏测量中多层薄膜拟和模型建立的过程,并对一未知多层光学薄膜进行了椭偏分析,建立了substrate/film1/EMA/film2/srough的物理结构模型。采用椭偏法,在首先确定出基底光学常数的基础上,提出了从单层、双层、三层逐次建模拟和的分析方法。研究结果表明:对于透明或弱吸收光学薄膜,采用柯西公式可以较好表征材料的色散关系。椭偏分析最终得到的未知薄膜基本结构为G(1.52)/2.0312(203.0nm)1.4636(170.1nm)2.0791(170.4nm)/A,膜系设计及分光光度计测量的透射光谱证实了这一结果。对多层膜厚度和光学常数的分析表明,椭偏法仍然是一种行之有效的薄膜光学常数测量方法。
The fitting model of multi-layer thin films in ellipsometry analysis was established. An unknown film was investigated and the physical structure model of substrate/filml/EMA/film2/srough was applied. Based on spectroscopic ellipsometry after determining the optical constant of the substrate, the modeling method of increased layers from single to 3-layer was provided. The results indicate that the Cauchy dispersion model is available for optical transparent or weak-absorption thin films. The structure of the unknown film was fitted with a model of G （1.52）/2.031 2 （203.0 nm） 1.4636 （170.1 nm） 2.0791 （170.4 nm） /A by ellipsometry analysis method, and the result was confirmed by the transmission spectrum from a spectrophotometer. The analysis to optical constant and film thickness also show that the ellipsometry is effective for multi-layer thin films analysis.
出处
《光电工程》
CAS
CSCD
北大核心
2009年第2期29-33,共5页
Opto-Electronic Engineering
基金
西安市科技创新支撑计划(YF07051)
陕西省科技计划项目(2007K07-17)
关键词
薄膜
厚度
光学常数
椭偏测量
thin film
thickness
optical constant
spectroscopic ellipsometry
