摘要
制得的SnO_x薄膜,用扫描电子显微镜和X射线衍射仪分析,显示为平均颗粒小于50nm的超微粒子薄膜。其中组成颗粒的晶粒大小平均为5.0～8.0nm。讨论了沉膜过程中基底温度、氧气分压、放电电压、蒸发源温度和反应蒸镀时间对薄膜结构和性质的影响。得到了制备SnO_2相含量较高,且接近无色透明的超微粒子薄膜的最佳工艺条件。
The SnO_x films are analysised by scanning electron microscope and X-ray diffraction. The results show that the SnO_x films are UPFs with the average particle size below 50nm, where the particles are composed of crystal grain which the average size is 5.0～8.0nm.The influence of substrate temperature, oxygen partial pressure, gas discharge voltage,evaporated, source temperature and reactive evaporation time on structure and properties of the films is discussed. The optimum technological conditions of preparing the UPFs with more SnO_2 phase and almost colourless are confirmed.
基金
国家自然科学基金(编号:190174016)
关键词
氧化锡
蒸发
薄膜
沉积
tin oxide
evaporation
films
deposition
grannlar structure
ultrafine particle
