摘要
利用真空喷射沉积技术制备厂Zn纳米颗粒薄膜，研究了工艺参数对薄膜形貌及晶体结构的影响规律，给出了颗粒尺度和外形随Ar气流量、蒸发源温度、喷嘴尺寸形状和沉积时间的变化规律，并对其机理进行了分析。
Vacuum spurting deposition was developed to grow Zn nano-particle thin films. The influence of various growth parameters on surface topography and film structures was studied, and a few variables such as Ar gas flow, nanoparticles sizes and shape, crucible temperature, nozzle configuration and deposition time were also discussed to understand the growth mechanism.
出处
《真空科学与技术》
CSCD
北大核心
1998年第1期7-14,共8页
Vacuum Science and Technology
关键词
纳米颗粒
真空喷射沉积
薄膜
Nanometer particle, Vacuum spurting deposition, Thin film
