摘要
研究了反应电子束蒸发氧化物光学薄膜在空气中的应力。为了找到能减小多层膜结构内应力的淀积工艺参数 ,测试了氧化物膜层 Ti O2 ,Ta2 O5 ,Si O2 ,Al2 O3,Hf O2 的应力 ,发现有些膜层为压应力 ,一些高折射率膜为张应力。实验表明 ,热处理可以有效地降低氧化物膜层光学吸收 ,并改变应力。
The stresses of oxide optical thin films prepared by reactive electron beam evaporation have been investigated in air. In order to find out the deposition technological parameters for reducing the stress of multi layer film structure, the stresses of the oxide films such as TiO 2, Ta 2O 5, SiO 2, Al 2O 3 and HfO 2 are tested. We discover that the stresses in some films are compressive stresses and the others are tension stresses. The experiments reveal that the heat treatment can effectively reduce the optical absorption and change the stress.
出处
《光电工程》
CAS
CSCD
北大核心
2001年第1期13-15,共3页
Opto-Electronic Engineering
关键词
光学薄膜
热处理
电子束蒸发
氧化物
应力特性
Optical films
Heat treatment
Stress analysis
Electron beam evaporation
