摘要
薄膜应力对薄膜性能具有重要的影响。主要介绍了薄膜应力形成机理和应力实验的研究进展,并探讨了薄膜应力研究的发展趋势。通过选择适当的工艺条件以及表面处理可以改变薄膜的应力分布,提高薄膜的性能。
Influence of thin film stress is very significant on thin film properties. The progress of thin fill stress development mechanisms and stress experimental study is introduced. The dominant direction of the study of thin fill stress is discussed. Through the selection of processing parameters and surface modification. The distribution of thin film stress is possible changed and thin film property is improved.
出处
《真空与低温》
2006年第2期68-74,共7页
Vacuum and Cryogenics
基金
表面工程技术国家级重点实验室基金(51418060305HT6007)资助
关键词
薄膜
应力
光学薄膜
模型
thin film
stress
optical fill
model
