摘要
本文报道了应用直流反应磁控溅射技术淀积透明的TiO 2、Ta_2O_5、ZnO、Al_2O_3等氧化物光学薄膜。研究了这些氧化物薄膜的光学和机械等性能;讨论了反应溅射的SiO_x薄膜其光学吸收的反应动力学原因;摸索了TiO_2薄膜的性能与溅射镀膜条件的关系;研究了TiO_2薄膜的晶相结构;观察了TiO_2和ZnO薄膜的表面微观形貌。
Some of oxide thin films, TiO2, Ta2O5, ZnO, SiO2 and Al2O3, were deposited by DC reactive magnetron sputtering.The process of oxidation and sputter on the surface of metal target during reactive sputtering were analysed. The optical and mechanical properties of sputtered oxide films were given. The relation of properties of TiO2 films to sputter conditions were studied. Crystal structures and surface micro-topography of reactive sputtered TiO2 films on room temperature substrate were investigated.
基金
国家教委博士点基金
