摘要
提出了一种补偿刻蚀法 :在经过常规光刻热熔成形和离子束刻蚀技术制成的硅微透镜阵列上再涂敷几层光刻胶 ,以降低各单元微透镜的曲率 ,然后再次进行加热固化和离子束刻蚀。扫描电子显微镜 ( SEM)显示微透镜阵列为表面极为平缓的球冠形阵列 ,表面探针测试结果显示用补偿刻蚀法制作的微透镜的 F数和 F′数分别可达到 31.62和 35.88,而常规光刻热熔法很难制作出 F数和 F′数分别超过 1.0 0和 4 .0 0的微透镜阵列。光学填充因子也由常规方法的 64.3%提高至78.5% 。
A new method, named curvature compansation milling, is proposed to increase F/ of refractiave microlenses array (MLA). It is described as follows: in order to decrease curvature of MLA fabricated by the conventional method of photolithography/melting/ion beam milling, several new layers of photoresist are coated on MLA, then heated and consolidated, at last milled again. Scanning electron microscope (SEM) shows that microlens is gently spherical, and surface stylus measurement shows that F/ number and F′/ number of MLA, fabricated by the new method, is promoted to 3162 and 3588, respectively, compared with 100 and 400, hardly obtained by use of conventional way.And the filling factor is promoted from 643% to 785%. Using the new method, point spread funtions of MLAs are more ideal, and their image quality is improved.
出处
《中国激光》
EI
CAS
CSCD
北大核心
2000年第12期1097-1102,共6页
Chinese Journal of Lasers
基金
国家863高技术发展计划资助项目资助课题
关键词
微透镜阵列
光学性能测试
补偿刻蚀法
硅
microlenses array, ion beam milling, photoresist, point spread funtion
