摘要
本文介绍了一种新的ＪＧＰ－６００型磁控溅射沉积薄膜装置。该装置采用射频和直流兼容的磁控溅射靶，靶－基距可以在工作时调节，ＫＡＵＦＭＡＮ源离子束清洗，涡轮分子泵真空系统，磁力偶合输送机构及行星转动工作架。测试表明本装置是一台先进的半导体工艺设备，７５ｍｍ样品的膜厚均匀度不大于５％。
In this paper, JGP 600 a new device of the magnetron sputtering deposition is introduced. The three magnetron sputtering target qualified to RF and DC is used; The space between target and base can be abjusted during working; It is with the purification by ion beam of KAUFMAN source; The vacuum system with the turbo molocular pump, the delivery set up with magnetron force and workpiece frame of planet turn. The measurements show that this device is a progressive apparatus of the semi couductor technology; The uniform degree of thin film thickness on 75mm sample is not more than ±5%.
出处
《真空》
CAS
北大核心
1997年第1期30-33,共4页
Vacuum
