期刊文献+

KrF光刻胶单体4-叔丁氧基苯乙烯合成研究 被引量:1

Study on Synthesis of 4-tert-Butoxystyrene as KrF Photoresist Monomer
在线阅读 下载PDF
导出
摘要 4-叔丁氧基苯乙烯(PTBS)是合成KrF光刻胶成膜树脂的重要单体之一。以4-溴苯酚和异丁烯为起始原料,经酸催化得1-溴-4-叔丁氧基苯,再制备其格氏试剂,与氯乙烯发生Kumada偶联反应得目标化合物4-叔丁氧基苯乙烯。考察了催化剂类型、添加量及反应温度等对产物收率的影响。结果显示,浓硫酸催化制备的中间体收率为96.5%;三溴化铁催化偶联反应得到的目标化合物收率达90.5%;产物纯度均大于99.5%。通过核磁共振测试,中间体及目标产物的分子结构得到了表征。 4-tert-butoxystyrene(PTBS)is one of the important monomers for the film-forming resin of KrF photoresist.4-Bromophenol and isobutylene were used as the starting materials.Under acid catalysis,1-bromo-4-tert-butoxybenzene was obtained.Then its Grignard reagent was prepared and underwent Kumada coupling reaction with vinyl chloride to obtain the target compound,4-tert-butoxystyrene.The effects of the cata-lyst type,dosage,and reaction temperature on the product yield were explored.The results show that:The intermediate was prepared via catalysis by concentrated sulfuric acid with a yield of 96.5%;The coupling reaction catalyzed by iron tribromide afforded the target compound with a yield of 90.5%;The purity of the product was greater than 99.5%.Through nuclear magnetic resonance testing,the molec ular structures of the intermediate and the target product were characterized.
作者 卢畅吟 韦尚徐 覃秀灵 覃洁容 吴忠联 姚志艺 Lu Changyin;Wei Shangxu;Qin Xiuling;Qin Jierong;Wu Zhonglian;Yao Zhiyi(Guigang Weixin Technology Co.,Ltd.,Guangxi,537124;Guigang Dingyuan Synthetic Materials Manufacturing Co.,Ltd.,Guangxi,537124;School of Chemistry and Chemical Engineering,Jiangsu University of Technology,Jiangsu,213001)
出处 《当代化工研究》 2025年第9期170-172,共3页 Modern Chemical Research
基金 2024年自治区统筹支持工业振兴基金“制造业创新成果大规模工业化应用”资助项目“高端肉桂酸系列产品(光刻胶树脂及高纯溶剂)项目” 中央引导地方科技发展资金资助项目“半导体关键材料——光刻树脂及单体产业化项目”(项目编号:贵科中引专项2022)。
关键词 4-叔丁氧基苯乙烯 1-溴-4-叔丁氧基苯 KrF光刻胶 Kumada反应 4-tert-butoxystyrene 1-bromo-4-tert-butoxybenzene KrF photoresist Kumada reaction
  • 相关文献

参考文献3

二级参考文献77

  • 1刘明大,李淑文,史素姣.0.4μm条宽的光刻[J].半导体光电,1994,15(4):336-339. 被引量:10
  • 2Ledwith A,Rahnema M,Sen Gupta P K.Phenolic resins for solid phase peptide synthesis.Ⅲ.Copolymerization of acrylonitrile and p-acetoxystyrene and comparison of reactivity with styrene-based resins[J].J.Polym.Sci,Polym.Chem.Ed,1980,18(7):2239-2246.
  • 3Ono Y,Nishishita T,Sekiya M.Column packing for high-speed liquid chromatography[J].Jpn.Kokai Tokkyo Koho,1978,78:80291-80294.
  • 4Fujiwara H,Takahashi A,Suzuki K.Properties and application of poly(p-vinylphenol) (resin M)[J].Maruzen Sekiyu Giho,1976,21:1-15.
  • 5Kato Y,Kametani T,Furukawa K,et al.High-resolution preparative-scale gel permeation chromatography[J].J.Polym.Sci,Polym.Phys.Ed,1975,13(9):1695-1703.
  • 6Jean M J Frechet,Eichler E.Poly(p-tert-butoxycarbonyloxystyrene):a convenient precursor to p-hydroxystyrene resins[J].Polymer,1983,24(8):995-1000.
  • 7Strurtevant J,Conley W E.Photosensitization in dyed and undyed APEXE DUV resist[J].Proc.SPIE,1996,2724:273-279.
  • 8Ito H,Willson C G.Positive/negative mid UV resist with high thermal stability[J].Proc.SPIE,1987,771:24-30.
  • 9Ito H,Pederson L A.Sensitive electron beam resist systems based on acid-catalyzed deprotection[J].Proc.SPIE,1989,1086:11-17.
  • 10Dammel R R,Rahman M D,Lu P H,et al.Lithographic performance of isomeric hydroxystyrene polymers[J].Proc.SPIE,1994,2195:542-558.

共引文献9

同被引文献8

引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部