摘要
本文用热丝 CVD 法在氮化硅复合陶瓷及 Sialon 陶瓷上沉积了金刚石薄膜,用 X 射线衍射、拉曼光谱、扫描电子显微镜、表面形貌仪、划痕实验仪对所形成的膜及基体进行了分析。初步探讨了膜与基材的附着性影响因素。
In this paper,diamond film had been synthesized on Si_3N_4+SiC composite ce-ramics and sialon ceramics by HFCVD(hot filament chemical vapor deposition).The obtaindfilms were analysized by X-ray diffraction,Raman spectrometer,scanning electron microscopy,profilograph and scratch tester.The adhesion of the film was measured and the effective actor ofthe adhesion between the film and substrate was tentativly studied.
基金
国家自然科学基金
9587007-02
