摘要
介绍了用于波长为 15 5 0nm光通讯波分复用 /解复用滤光片的离子束溅射的Ta2 O5和SiO2 薄膜在法里珀罗多层膜中的折射率的实时拟合方法及拟合结果 ,给出了它们的淀积时间、淀积速率和计算的光学厚度 。
A curve-fit method and fitting results of refractive indexes of Ta2O5 and SiO2 thin films deposited by using ion beam sputtering in Fabry-Perot multilayer systems used for optical telecommunication dielectric thin film filters (MUx/Demux) at wavelength 1550 nm are presented. The sputtering time, deposition rate and optical thickness of each layers of the filters are given. At last, the measured results by means of curve fitting are discussed.
出处
《光学学报》
EI
CAS
CSCD
北大核心
2002年第3期290-293,共4页
Acta Optica Sinica
基金
高等学校重点实验室访问教学基金资助课题
