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光学镀膜仪静态特性研究 被引量:1

Experimental investigation on static characteristics of optical thin-film deposition equipment
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摘要 光学镀膜仪的静态特性是高精度镀膜系统的重要因素。对典型镀膜仪的膜厚监视器的静态漂移数据,采用t检验、回归分析、方差分析、样本标准偏差和不确定度分析等方法获得其静态特性。发现不同预热时间有不同的系统静态特性;建立静态漂移的线性回归、二次回归数学模型,其线性漂移率为-5.5×10-5,二次漂移率为5.02322×10-8;显示值相对于期望曲线的最大偏差为±4×10-3。该静态特性详细、稳定和精确,为镀膜经验控制、膜系修正和自动化系统开发奠定了基础。 Static characteristics of optical thin - film deposition equipment which deposition of high precision thin - film and development of intelligent system is studied. Based on static drift data from thin - film thickness monitoring instrument of typical deposition equipment,many static characteristics were obtained with following methods: t verify, regress analysis, variance analysis, sample standard deviation analysis and uncertainty analysis. The static characteristics were varied with preheating time. The linear regress and quadratic regress mathematics models of static drift data were established, which linear drift rate and quadratic drift rate respectally were - 5.5 ×10^-5 and 5.02322×10^-8. Compared with expected curve, the maximal deviation of show value was ±4×10^-3. The static characteristics were detailed, stable and accurate, this research lays a concrete foundation for the experiential monitoring control thin - film, the film series revision, the next step development of intelligent system of film design and deposition.
出处 《黑龙江大学自然科学学报》 CAS 北大核心 2006年第2期272-275,共4页 Journal of Natural Science of Heilongjiang University
基金 兵器工业科研基金项目(zz9682-3) 西安工业学院校长科研基金项目(XGYXJJ-200346)
关键词 光学薄膜 静态特性 回归分析 方差分析 镀膜仪 漂移率 optical thin - film static characteristic regress analysis variance analysis thin - film deposition equipment drift rate
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