摘要
采用真空等离子沉积法沉积了类金刚石膜 ,采用椭圆偏振光测量法测量了薄膜的厚度。
Diamond like film was deposited on the substrate of monocrystalline silicon chip by vacuum plasma deposition.Because this film is very thin,many current measurement methods can't be used to measure the thickness of above film.In this paper,the thickness was measured by elliptically polarized light.At the same,thickness distribution over the whole surface of substrate can be known.
出处
《新技术新工艺》
北大核心
2001年第2期43-45,共3页
New Technology & New Process
