摘要
本文应用离子束溅射技术,以氩,氢为混合气体,在硅片与玻璃片上沉积类金刚石薄膜。测定了在不同离子束束流强度、束流能量和混合气体比的条件下薄膜的生长速率及主要性能。探讨了最佳沉积条件。
Diamond-like thin films were successfully deposited on theSi and glass plates by the ion beam sputtering technique with the help of themixture of argon and hydrogen.The growth rates and main properties of thesethin films doposited under different conditions were measured and determined,and the optimum conditions are discussed.
出处
《人工晶体学报》
EI
CAS
CSCD
1990年第1期52-57,共6页
Journal of Synthetic Crystals
基金
上海巿自然科学基金
