摘要
本文首次提出用分形理论研究CVD方法生长金刚石薄膜中基片表面形貌对成核密度的影响,发现:成核密度n与基片表面分形维数D之间存在一定关系;在D介于2～3时,n有峰值存存。
In the present paper the fractal theory is used to study the effect of the shape of the substrate's surface on the nuclea tional density of diamond thin film made by CVD. The results show that n is relate to D_3; when D_3 is between 2 and 3, n would have the maximum value.
出处
《功能材料》
EI
CAS
CSCD
1991年第2期74-77,共4页
Journal of Functional Materials
