摘要
本文讨论了金刚石薄膜应用于光学领域所遇到的问题，研究了热丝ＣＶＤ（ＨＦＣＶＤ）方法生长应用于光学膜的金刚石薄膜过程中，衬底表面的预处理和沉积条件如碳源浓度、衬底温度等对制备腹晶粒尺度和晶粒间界以及膜表面形貌的影响．
Some problems,which exist in the useful optical application of diamond thin films,have been discussedin this paper.In diamond thin films growth by HFCVD,the effects of pre-handle of substrates and carbonconcentrate of reation gas,substrates temperature on the grains size,grain boundry and surface morphologof the resulting films have been studied.
出处
《量子电子学》
CAS
CSCD
1994年第4期280-284,共5页
