摘要
介绍了 ｃ－ＢＮ的优异特性及应用前景。评述了 ｃ－ＢＮ膜的几种低压物 理气相沉积（ＰＶＤ）和低压化学气相沉积（ＣＶＤ）制备方法，分析其成膜特点及对ｃ－ ＢＮ形成有显著影响的工艺参数。介绍了当前ｃ－ＢＮ膜研究取得的成果，对如何提 高成膜质量提出了自己的一些看法。
The excellent properties and the application prospects of cubic boron nitride(c-BN) films are introduced. A variety of low pressure PVD and CVD methods for synthesising c--BN films are summarized. An analysis is made of the deposition parameters which favour the formation of the cubic phase. Newly attained progresses to preparing c-BN films are introduced. And some proposals for acquiring high quality c-BN films are also offered.
出处
《表面技术》
EI
CAS
CSCD
2000年第1期1-5,共5页
Surface Technology
基金
浙江省自然科学基金
