摘要
低压气相沉积金刚石薄膜的工艺,按基本原理可分为化学气相沉积、离子束沉积、等离子化学沉积和化学转化方法。文中详细介绍了各类方法的特点及沉积机理,指出存在的问题,并对今后的发展提出了看法。
The process for low pressure gas phase deposition of diamond film can be divided into chemical gas phase deposition, ion beam deposition, plasma chemical deposition and chemical conversion based on the fundamental principles. This paper introduces in detail the characteristics of various methods and the deposition mechanisms, points out the existing problems and puts forward its viewpoints for the future development.
出处
《表面技术》
EI
CAS
CSCD
1991年第6期1-7,共7页
Surface Technology
