摘要
用微波ＥＣＲ等离子体溅射技术制备透明导电ZnO（Ａ１）膜的工艺中，氧气和氩气的流量、膜的生长温度等因素相互制约并严重影响着膜的光电性能．实验得出：存在着一个温度和相应的氧流量区，在此区域内，沉积的ＺｎＯ（Ａ１）膜既有较高的透光性又有较高的导电性．本工作在一定条件下制备出电阻率约为１０-5Ω·ｍ数量级、可见光区域平均透光率Ｔvi约为８５％的透明导电ＺｎＯ（Ａ１）膜．
The transparency to visible light and conduction of the Al-doped Zinc OxideZnO(A1) thin films were studied in the Electron-Cyclotron-Resonance(ECR) plasma sputtering method.The experimental results indicated that there is a regin,in which the filmsprepared have good transparent and conductive properties. The temperature region is130~160℃, and the oxygen flow is 0.2× 10-6~2 10-６ m３ /s. In addition, the filmhaving Tvi about 85% and about 10-5×Ω ·m was deposited in the region.
出处
《北京服装学院学报（自然科学版）》
CAS
1999年第2期52-56,共5页
Journal of Beijing Institute of Fashion Technology：Natural Science Edition
基金
国家自然科学基金
关键词
微波等离子体
温度
氧流量
氧化锌薄膜
光电性能
ECR sputtering method
ZnO(A1) thin films
transparent and conductive prop-erties
temperature
oxygen flow
