摘要
概述了透明导电薄膜的分类及ITO薄膜的基本性质,综述了用于制备ITO薄膜的磁控溅射法、真空蒸发法、溶胶-凝胶法、喷雾热解法、化学气相沉积法,论述了不同制备方法的优缺点。最后,介绍了ITO薄膜的应用现状,并对ITO薄膜的发展趋势进行了展望。
The type of transparent and conductive thin films and the properties of ITO films are reviewed briefly.The fabrication techniques of ITO films are summarized and their advantages and disadvantages are compared.Finally,the applications of ITO films are introduced and the further development of ITO thin films is investigated.
出处
《材料开发与应用》
CAS
2010年第4期68-71,86,共5页
Development and Application of Materials
