摘要
文中介绍了蓝宝石基片的主要抛光方法,包括浮法抛光、机械化学抛光、化学机械抛光和水合抛光等,对它们的工作原理、特点作了分析和总结。
The main polishing technique of sapphire substrates is present in this paper, including float polishing, mechanical chemical polishing, chemical mechanical polishing, hydration polishing and so on. And their polishing mechanism and characteristics were analyzed.
出处
《机械工程师》
2009年第11期16-18,共3页
Mechanical Engineer
关键词
蓝宝石
超光滑表面
抛光
sapphire
uhra-smooth surface
polishing
