摘要
将IC工艺与LIGA工艺结合,在硅基上用镍材料制作高精度电容式双轴微加速度传感器。根据力学原理并结合所采用的工艺特点,对该器件结构进行优化设计,获得了较好的器件性能参数。结果表明,器件的静态电容为2.6pF,量程达±5g。该加速度传感器可同时测量X,Y方向的加速度,最小可测量加速度为2μg/Hz。在开环条件下器件的共振频率为900Hz,频带宽度在0200Hz之间。芯片的几何尺寸约为4×4mm。
お novel metalic two axis capacitive microaccelerometer is presented in this paper. An analytical formula, which is expressed as a function of the structural factor k, was used to optimize the design process, where k is simply the cantilever length l1 over the total length (cantilever length + proofmass length) l2. Best sensitivity can be obtained while k=0.52. Nickel is used as the structure material. Its higher density is in favour of obtaining higher sensitivity. The sensitivity S 10%/g can be reached under following structure configurations: total length l2=2750μm, cantilever length l1=1430μm, proof mass width W=400μm, cantilever width w=25μm, gap between stationary electrode and seismic mass d=4μm. The inside proof mass structures and overall structure height (150μm) are also optimized in considering of the dumping ratio. The metalic structures are fabricated using wellknown LIGA process on a silicon substrate. A two axis accelerometer can be easily made by this process. Two optical masks and one xray mask are needed for the device fabrication. The static capacity of the device is calculated 2.6pF. The open loop resonance frequency is 900Hz. Its working range is ± 5g. The chip size is about 4×4 mm.
出处
《功能材料与器件学报》
CAS
CSCD
1998年第2期121-125,共5页
Journal of Functional Materials and Devices