摘要
用微波等离子体化学气相沉积（ＣＶＤ）设备，在经过不同粒度的ＳｉＣ研磨粉进行粗化预处理过的金属钼衬底上沉积出了表面形貌有较大差异的金刚石薄膜，分别用扫描电子显微镜（ＳＥＭ）、光学显微镜和Ｘ射线衍射谱（ＸＲＤ）以及Ｒａｍａｎ光谱对样品进行了分析测试，并研究了各样品的场致电子发射特性。结果发现：在我们的实验范围内，对钼衬底研磨预处理所用的ＳｉＣ研磨粉的粒度越大，其上沉积出的金刚石薄膜样品的表面越粗糙；而金刚石薄膜的表面越粗糙，其场致发射的效果也越好。
Diamond films with various surface morphologies were obtained,which were deposited on metal Mo substrates (the substrates were mechanical scratched by vary sized SiC powder)by microwave plasmaassisted chemical vapor deposition(CVD)system.The films were characterized by X ray diffraction(XRD)、Raman spectrum、Optical microscopy、Scanning electron microscopy(SEM) and the emission character of the films were investigated.The result of experiment indicates that diamond films with ball like graphitic surface morphologies,which consisted of diamond nulei,were obtained.The larger of the size of SiC powders in which substrats were pretreated,the rougher of the surfaec of the diamond thin films ,and the rougher of the surface of the diamond films,the better of the emission character.
出处
《微细加工技术》
1998年第2期18-23,共6页
Microfabrication Technology
关键词
金刚石薄膜
研磨预处理
场致电子发射
Diamond thin films
Mechanical scratching pretreatment
Field eletron emission
