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SiGe HBT高频噪声特性研究 被引量:2

High Frequency Noise Characteristics of SiGe HBTs
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摘要 对SiGe HBT的高频噪声进行了模拟。频率f、载流子正向延迟时间τF、集电极电流等因素都对高频噪声有影响。当频率高于高频转角频率时,最小噪声系数NFmin随着频率的增大而线性增大,而不是与f2成正比关系,且NFmin随着集电极电流的增大先减小后增大。结果表明,噪声最小时的最佳偏置电流所对应的特征频率fT并不是最大特征频率,约为最大特征频率的50%。 High frequency noise characteristics of SiGe HBTs were simulated. Many factors, such as frequency, carrier forward delay time τF and collector current, have influence on high frequency noise characteristics. When the frequency was higher than high-frequency comer frequency, the minimum noise figure NFmin was directly proportional to f but not f^2 ; NFmin decreased at low collector current and then increased as the collector current increases. Result from simulation shows optimum collector current of minimum noise figure is not the maximum fT,
出处 《半导体技术》 CAS CSCD 北大核心 2007年第5期394-396,405,共4页 Semiconductor Technology
基金 国家自然科学基金项目(60376033) 北京市教委科技发展计划项目(KM200710005015) 模拟集成电路国家重点实验室基金项目(51439010804QT0101)
关键词 硅锗 异质结双极型晶体管 高频噪声 SiGe HBT high-frequency noise that the cutoff frequency fT at the but nearly fifty percent of it.
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参考文献6

  • 1IYER S S,PATTON G L.SiGe HBTs by MBE[J].IEEE Electron Device Letters,1988,9(4):165-167.
  • 2GUOFU NIU.A unified approach to RF and microwave noise parameter modeling in bipolar transistors[J].IEEE Transactions on Electron Devices,2001,48:2568-2574.
  • 3HILLBRAND H,RUSSER P H.An efficient method for computer aided noise analysis of linear networks[J].IEEE Trans Circuits Syst,1976,23:235-238.
  • 4VENDELIN G D,PAVIO A M,RHODE U L.Microwave circuit design using linear and nonlinear techniques[J].New York Wiley,1990,2:93-97.
  • 5CRESSLER J D,GUOFU NIU.Silicon-germanium heterojunction bipolar transistors[M].Boston London:Artech House Publishers,2002:147.
  • 6GUOFU NIU.A unified approach to RF and microwave noise parameter modeling in bipolar transistors[J].IEEE Transactions on Electron Devices,2001,48:2568-2574.

同被引文献29

  • 1徐剑芳,李成,赖虹凯.微波大功率SiGe HBT的研究进展及其应用[J].微电子学,2005,35(5):521-526. 被引量:5
  • 2高勇,刘静,马丽.Si_(1-x-y)Ge_xC_y合金材料物理特性研究进展[J].微电子学,2005,35(5):527-530. 被引量:2
  • 3焦世龙,陈堂胜,钱峰,冯欧,蒋幼泉,李拂晓,邵凯,叶玉堂.5Gb/s单片集成GaAs MSM/PHEMT 850nm光接收机前端[J].Journal of Semiconductors,2007,28(4):587-591. 被引量:2
  • 4舒斌,张鹤鸣,任冬玲,王伟.基于应变Si/SiGe的CMOS电特性模拟研究[J].半导体技术,2007,32(5):397-401. 被引量:1
  • 5任冬玲,张鹤鸣,舒斌,户秋瑾,宋建军.延续摩尔定律的新材料——应变Si[J].半导体技术,2007,32(8):650-652. 被引量:4
  • 6Liu R C,Masuda T,Tanabe M A.3-10 GHz Bandwidth Low-Noise Amplifier for Full-Band UWB Communications in 0.25 μm SiGe BiCMOS Technology[C]//IEEE Radio Frequency Integrated Circuits (RFIC) Symposium,Long Beach,CA,USA,2005.
  • 7Jin T,Guofu N,Zhengrong J,et al.Modeling and Characterization of SiGe HBT Low-Frequency Noise Figures-of-Merit for RFIC Applications[J].IEEE Transactions on Microwave Theory and Techniques,2002,50(11):2467-2473.
  • 8John D C,Ramkumar K,Gang Z,et al.An Investigation of the Origins of the Variable Proton Tolerance in Multiple SiGe HBT BiCMOS Technology Generations[J].IEEE Transactions on Nuclear Science,2002,49(6):3203-3207.
  • 9Gray P R,Meyer R G.Analysis and Design of Analog Integrated circuit[M].Fourth Edition.Beijing:Higher Education press,2005.
  • 10Federico Bruccoleri,Eric A M.Klumperink.Wide-band CMOS Low-Noise Amplifier Exploiting Thermal Noise Canceling[J].IEEE J.Solid-State Circuits,2004,39(2):275-282.

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