摘要
InSb薄膜被广泛应用于光电元件、磁阻元件、霍尔元件以及晶体管结构器件之中。研究了一种应用于的抛光液,在一定压力、温度、转速下,以有机碱替代无机碱,通过添加螯合剂、活性剂降低产品表面粗糙度,减少划伤,表面污染小。
InSb films are widely used in optoelectronic components, reluctance components, Hall element and transistor structure devices. The research on CMP slurry of semiconductor material InSb was proposed, in a certain pressure, temperature, rotational speed, with organic alkali alternative inorganic alkali, through the addition of aogeji, reactive agents to reduce surface roughness of products, reducing scratch and contamination.
出处
《半导体技术》
CAS
CSCD
北大核心
2006年第12期912-914,共3页
Semiconductor Technology
关键词
锑化钢
抛光液
抛光
划伤
粗糙度
InSb
polishing slurry
polishing
scratch
roughness
