摘要
研究了退火对类金刚石碳膜结构和性能的影响.结果表明:低于400℃退火对膜的结构、电阻率、硬度无明显影响;高于400℃退火,由于膜中氢原子的逸出,非晶碳将转变为石墨微晶,从而导致电阻率急剧下降;在400～700℃温度范围退火后,膜的硬度仍无明显变化.
It is known that DLC film has amorphous structure with a little amount of microcrystalline and thatthe structure and properties of the metastable amorphous film become gradually unstable upon heating[4].The authors' results show that annealing at temperatures lower than 400℃ has no appreciable effect onthe structure,the electrical resistivity,and the hardness of DLC film prepared by glow discharge deposi-tion technique.That such DLC film is thermostable when annealed below 400℃ is believed to be useful in-formation in engineering.When annealing is performed at temperatures higher than 400℃,the amor-phous structure of the film will be transformed into the crystallite graphite,due to the dehydrogenation ofDLC film.As a result,the resistivity of the film suddenly decreases by 11～12 orders in magnitude.Thehardness of the film,however,remains approximately constant after annealing in the range of temperature400℃～700℃.In the present paper the variations of the structure and the properties of DLC film in the annealingprocess are experimently investigated by using Raman spectroscopy and transmission electronmicroscopy,and by making electrical resistivity and microhardness measurements.
出处
《西北工业大学学报》
EI
CAS
CSCD
北大核心
1993年第2期229-232,共4页
Journal of Northwestern Polytechnical University
