摘要
介绍了将激光驻波聚焦原子束技术用于制作纳米级图形的基本原理和实验系统设计。研究了驻波透镜对原子束的聚焦特性及像差 ,数值结果显示原子束在置于焦平面处的基底上所沉积的条纹半高宽为 10nm左右 ,可以实现纳米级超微细图形的制作。
The basic principle and experimental system design for applying laser focused atomic beams technique to fabricate nano patterns are introduced. The focusing properties and aberrations of standing wave (SW) lens for a thermal atomic beam are studied through numerical simulation. The result shows that this type of SW lens can be used for atomic nanofabrication (ANF). The FWHM of the line width deposited on the substrate at the focal plane of the thermal atomic beam is about 10nm. The experimental set up and primary results are given.
出处
《微纳电子技术》
CAS
2003年第7期546-549,556,共5页
Micronanoelectronic Technology
基金
中科院知识创新基金资助项目 (A2K0 0 0 9)
微细加工光学技术国家重点实验室开放基金资助项目 (KFS4)
