摘要
本文制备了硅基和光刻胶两种材料的纳米光栅,利用光谱椭偏仪对该纳米结构的光栅进行了测量,随后利用建立的拟合模型对其测量数据进行了拟合,结果证明了运用该仪器进行纳米光栅结构无损检测的可行性,在入射角60?,方位角75?的测量条件下,纳米结构关键尺寸、侧壁角等三维形貌参数的测量精度最大可达99.97%,该技术对于无损检测有着一定的推动意义.
The silicon nanometer structure grating and the photoresist nanometer structure grating were prepared. A fitting model was built on the new self-developed sepctroscopic ellipsometer. Then, the gratings was tested and fitted. Results proved that the machine could work well in nondestructive test of nano grating. Under the condition of the incident angle of 60° and the azimuth angle of 75°, the measurement accuracy can be up to 99.97% for the three-dimensional morphology parameters such as key dimension and sidewall angle and so on, and the maximum error is less than 1%. This method is significant for the nondestructive test.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
2014年第3期482-486,共5页
Acta Physica Sinica
基金
国家自然科学基金(批准号:61076042
60607006)
国家重大科学仪器设备开发专项(批准号:2011YQ16000205)
国家高技术研究发展计划(批准号:2011AA03A106)资助的课题~~
关键词
纳米压印
光栅
无损检测
拟合
nanoimprint lithography, grating, nondestructive testing, fitting
