摘要
ZnO薄膜是一种具有优良的压电、光电、气敏、压敏等性质的材料。ZnO薄膜的制备方法多样,薄膜的性质取决于不同的掺杂组分,并与制备工艺紧密相关。简述了ZnO薄膜的制备方法与基本性质与应用,分析了ZnO薄膜研究、应用与开发现状,展望了产业化发展前景。
ZnO thin films have many excellent properties such as piezoelectricity, optoelectricity, gas-sensitivity and voltage dependence. There are many methods for the preparation of ZnO thin films, whose properties depend on dopants and preparation conditions. This paper describes preparation methods and properties of ZnO thin films. The present status of research, application and development, and commercialization prospect of the film are reviewed as well.
出处
《材料导报》
EI
CAS
CSCD
2003年第F09期207-209,213,共4页
Materials Reports
基金
河南省科技攻关项目资助(编号:0124120203)
