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INCREASING BREAKDOWN VOLTAGE OF LDMOST USING BURIED LAYER

INCREASING BREAKDOWN VOLTAGE OF LDMOST USING BURIED LAYER
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摘要 A new LDMOST structure, named B-LDMOST that has a buried layer under the drain is proposed. The buried layer is not connected to the drift region, so it can optimize the vertical field distribution and increase breakdown voltage. The analysis and the simulated results show that B-LDMOST can increase breakdown voltage, with almost negligible influence on the other parameters such as on-resistance, switching time, and so on. A new LDMOST structure, named B-LDMOST that has a buried layer under the drain is proposed. The buried layer is not connected to the drift region, so it can optimize the vertical field distribution and increase breakdown voltage. The analysis and the simulated results show that B-LDMOST can increase breakdown voltage, with almost negligible influence on the other parameters such as on-resistance, switching time, and so on.
出处 《Journal of Electronics(China)》 2003年第1期29-32,共4页 电子科学学刊(英文版)
基金 Supported by the National Natural Science Foundation of China(No.69776041)
关键词 B-LDMOST Buried layer Breakdown voltage Ou-resistance Switching time 埋层 击穿电压 接通电阻 转换时间 高压集成电路 B-LDMOST
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