摘要
用微波ECR等离子体源离子注入 (PSII)法 ,在硅片 ( 10 0 )上制备了类金刚石 (DLC)薄膜 ,工作气体采用CH4气体 ,研究了不同的气体流量对薄膜的影响。对制备的DLC薄膜 ,用拉曼光谱、FT IR光谱、AFM以及纳米压痕等手段对化学成分、化学键结构。
Diamond like carbon(DLC) films were grown on Si(100) substrates by microwave electron cyclotron resonance (ECR) plasma source ion implantation (PSII) with methane as the working gas.The films were characterized with Raman spectroscopy,Fourier transformation infrared spectroscopy(FT IR),atomic force microscopy (AFM) and nano indentation.Influence of gas flux on the film growth was also studied.
出处
《真空科学与技术》
CSCD
北大核心
2003年第6期429-431,共3页
Vacuum Science and Technology
基金
国家自然科学基金重点项目 5 0 13 5 0 40
