摘要
用计算机分析系统对不同TiNPVD涂层工艺的镀膜层相组成进行了分析,并用Winfit和Origin软件对X衍射图谱进行作图标定。研究表明,TiN涂层相组成主要有TiN、Ti2N、TiN0.26和FeTi相;工艺参数(如负偏压、靶电流和氮分压等)对涂层性能和质量的影响很大。在分析的基础上提出了合理的工艺参数。
The phase structures of TiN coatings using different PVD techniques are analyzed by a computer system, and the X-ray diffraction patterns are labeled with the software of Winfit and Origin. It is shown that the main constituents of TiN coatings are TiN, Ti2N, TiN0.26 and FeTi, and the processing parameters of PVD, such as minus bias, target current and partial pressure have great effect on the quality of the coatings. Reasonable processing parameters are given in this paper.
出处
《武汉理工大学学报（信息与管理工程版）》
CAS
2003年第2期50-52,56,共4页
Journal of Wuhan University of Technology：Information & Management Engineering
基金
湖北省科委自然科学基金资助项目(J96021)
