摘要
电弧离子镀至今仍是硬质膜的主流技术 ,但是 ,其内容与 80年代比已大为丰富。首先 ,镀层材料由单一氮化钛 ,发展到氮化钛与碳氮化钛、氮化钛铝、氮化铬等多种材料并用。然后 ,又进一步发展为多层复合镀层。远离平衡态过程的低温沉积技术日趋成熟 ,使各种机械零件的需磨损耐腐蚀镀层逐步走向实用化 ,促进了机械工业水平全面提高。低温沉积技术大幅度降低镀层内应力 ,使镀层的厚度能够达到数十 ,甚至上百微米 ,满足了发展高性能特种镀层的需要 ,如 Ti B2 抗空蚀镀层、Ti(C,N)抗冲蚀镀层 ,电弧离子镀制备 MCr Al Y镀层 ,现已进入产业化。与此同时 ,Ti N复合膜作为耐磨耐蚀镀层也取得了成功。展望 2 1世纪 ,复合多层膜将得到更加广泛的应用 ,并向纳米复合膜发展。镀膜机内渗氮镀膜连续二重工艺可望成功 ,并在提高耐磨耐蚀性上取得显著效果。远离平衡态镀膜技术水平将进一步提高 ,成本大幅度降低 ,并在合成新型镀层材料、制备厚镀层。
Titanium nitride and related overlayers produced by arc ion plating(AIP)are applied as commercial coatings in world wide scale since the middle of 80s. Due to the achievements of low temperature deposition(LTD), they begin now to be used as wear and corrosion resistant coatings for machine parts, besides applications on cemented carbide and high speed steel cutting tools. On the other side, TiN can be now applied successfully to brass, Al alloy, ZnAl alloy articles as decorative coating through LTD. Various nitrides, carbonitrides, borides and other refractory compounds, such as (Ti,Al)N, TiCN, CrN,are used as the coatings for special heavy duty working conditions instead of TiN since 90s. More and more multilayer coatings are applied now substituting single layer ones. Duplex processes are under development.
出处
《真空》
CAS
北大核心
2000年第1期1-11,共11页
Vacuum
关键词
硬质新材料
低温沉积
硬质膜技术
离子镀
titanium nitride
arc ion plating
low temperature deposition
refractory compound
protective coating
