摘要
采用电子回旋共振微波等离子体源增强磁控溅射沉积氧化铝薄膜.X射线光电子谱和X射线衍射分析表明,在600℃沉积温度下,Si（100）基片上获得了亚稳的具有化学计量配比成分、面心立方结构的γ-Al2O3薄膜.薄膜的折射率为1.7,与稳定的α-Al2O3体材料相当.
The aluminium oxide films were deposited on Si(100) substrate by plasma source enhanced magnetron sputtering by using an electron cyclotron resonance (ECR) microwave plasma source and a direct current magnetron sputtering target. X-ray photoelectron spectroscopy (XPS) and glancing angle X-ray diffraction patterns show that the metastable stoichiometric gamma-Al2O3 films can be obtained at a higher deposition temperature of 600degreesC. The refractive index of the films is 1.7, corresponding with that of stable alpha-Al2O3.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
2002年第4期887-890,共4页
Journal of Inorganic Materials
基金
国家自然科学基金(69889701)
教育部科学技术研究重点项目
