摘要
本文采用独特的电子束蒸镀方法，在光学镀膜机上，以 ＺｎＯ＋３％Ａｌ２Ｏ３和 ＺｎＯ为膜料．ｋ９光学玻璃为衬底，制备出ＺｎＯ 膜。膜层为多晶膜，可见光透过率为Ｔ＝７０－９０％，电阻率ｐ＝１×１０－５Ω·ｍ，方电阻为 Ｒ ＝１５０±５０±５０Ω／ ，膜机械强度超过国标单层标准，找到实用最佳工艺条件。
This paper described that the ZnO film have been prepared by electron gun evaporation. As the film material, ZnO + 3% Al203 was doped into ZnO film. Under differe,it process condition, polycrystal structure of the ZnO films were obtained. Transmittance(visible range)T = 70 -90%, resistivity p =1x 10-5Ω/ , square resistance R =150±50Ω/ . The mechanical strength of sample films were super than the national single film standard. The best process condition has found.
出处
《应用光学》
CAS
CSCD
2002年第2期35-38,共4页
Journal of Applied Optics
