期刊文献+

用于辅助镀膜的霍尔等离子体源 被引量:5

The hall accelerater for assisted deposition
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摘要 论述了该源的工作原理 ,讨论并测试了该源最佳的磁场及分布。设计采用了永久磁铁并利用极靴产生发散磁 ,沿轴向有较大梯度的磁场 ,又称该源为端部霍尔加速器。 The design of the hall accelerater and the optimum magnetic structure were presented. The permenent magnet was applied. The pole pieces were arranged to obtain the divergent magnetism and strong magnetism gradient along axial direction. The design gives us a good results.
出处 《光学仪器》 2001年第5期58-62,共5页 Optical Instruments
关键词 光学镀膜 离子束辅助镀膜 等离子体加速 optical coating ion assisted deposition plasma accelerates
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参考文献3

  • 1[1]H R Kaufman, R S Robinson, R J Seddon, End-Hall ion source [J]. J. Vac. Sci. Technol. 1987, A5(4): 78~87.
  • 2[2]H R Kaufman, Technology of closed-Drifed Thrusters [J]. AIAA journal, 1983,23: 78~87.
  • 3[3]L Fulton, R Cabrera, Ion assisted deposition Using A High output End-Hall Ion Source in Optical Interference Coatings [J], SPIE, 1998, 12/MA-5.

同被引文献42

  • 1李仲伢,李成富,龚辉.激光处理对光学薄膜和激光玻璃损伤的影响[J].光学学报,1994,14(3):281-286. 被引量:11
  • 2张大伟,洪瑞金,范树海,王英剑,邵建达,范正修.离子辅助沉积中离子束流密度的作用[J].光子学报,2005,34(3):477-480. 被引量:17
  • 3邵建达,范正修,易葵,王润文.薄Si膜对基底表面粗糙度的影响[J].中国激光,1996,23(9):801-805. 被引量:9
  • 4Mohan S,Krishna M G.A review of ion beam assisted depositon of optical thin films, Vacuum, 1995, 46(7): 645-659.
  • 5Mcnally J J,Jungling K C,Williams F L,et al.Optical coatings depostited using ion assisted deposition.J Vac Sci Technol A, 1987, 5(2): 2145-2149.
  • 6Martin P J.Ion-based methods for optical thin film deposition.Journal of Materials Science, 1986,21(1): 1-25.
  • 7Muller Karl-Heinz.Model for ion-assisted thin-film densification.J Appl Phys, 1986,59(8): 2803-2807.
  • 8Martin P J,Netterfield R P,Sainty W G.Modification of the optical and structural properties of dielectric ZrO2 films by ion-assisted deposition. J Appl Phys, 1984, 55(1): 235-241.
  • 9Targove J D,Macleod H A.Verification of momentum transfer as the dominant densifying mechanism in ion-assisted deposition.App Opt, 1988,27(18): 3779-3781.
  • 10Alvisi M,Nunzio G De,Perrone M R,et al.Influence of the assisting-ion-beam parameters on the laser-damage threshold of SiO2 films.Thin Solid Films, 1999,338(1-2): 269-275.

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