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走向光学工业应用的辅助镀膜霍尔等离子体源 被引量:4

The Hall accelerator for assisted deposition in optical industry application
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摘要 论述了霍尔等离子体源的工作原理 ,讨论并测试了该源最佳的磁场及分布。本设计采用永久磁铁并利用极靴产生发散磁场 ,及沿轴向有较大梯度的磁场 。 The IAD technology (Ion assisted deposition) attractes more attention recently because of the advantages. The Hall accelerator for IAD was developed. It has small size (  6cm), low energy (average energy 40-150eV), high beam current (200-1000mA), large uniformity (the uniform area >  50cm) and the compact construction. The design of the Hall accelerator and the optimum magnetic structure were presented. The permanent magnet was applied. The pole pieces were arranged to obtain the divergent magnetism and strong magnetism gradient along axial direction. The design gives us good results. The high discharge efficiency and low neutral loss were obtained. The Hall acceralater can work in low pressure 1×10 -2 -2×10 -2 Pa, low flowrates 5-10 SCCM stably.
出处 《核技术》 CAS CSCD 北大核心 2002年第9期679-683,共5页 Nuclear Techniques
关键词 光学工业 霍尔等离子体源 光学镀膜 离子束辅助镀膜 工作原理 霍尔电流加速器 Optical coating, Ion assisted deposition, Plasma accelerate
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参考文献3

  • 1[1]Kaufman H R, Robinson R S, Seddon R J. J Vac Sci Technol A, 1987, 5(4):78-87
  • 2[2]Kaufman H R. AIAA Journal, 1983, 23(1):78-87
  • 3[3]Plank G M, Kaufman H R, Robinson R S. AIAA Paper 82-1920, 1982

同被引文献20

  • 1尤大伟,任荆学,黄小刚,武建军.关于辅助沉积霍尔离子源的几个问题[J].真空科学与技术学报,2004,24(4):279-282. 被引量:4
  • 2尤大伟,黄小刚,任荆学,李安杰.用于薄膜制备的射频宽束离子源的设计[J].真空科学与技术学报,2004,24(6):451-454. 被引量:7
  • 3Kaufman H R, Robinson R S. J. VAC. Sci. Tecnol. A5 (4) Jul/ Aug. 1987:2081 - 2084
  • 4Kaufman H R. AIAA J. V23 N1,1985,1:78 - 87 679 - 68
  • 5Aston G, Kaufinan H R.AIAA:78- 669
  • 6Kaufman H R. AIAA.J.V15 Jul: 1025- 1034
  • 7Caner C E,Polk J E, Brophy J R. MAA:94- 3010
  • 8Loeb H W.AIAA:69 - 285
  • 9Loeb H W.AIAA:70- 1102
  • 10You dawei. Plasma Science & Tecnology 2004, V6 N4:

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