摘要
本文在探讨镀膜玻璃一些基本问题的基础上 ,阐述了磁控溅射在玻璃涂层技术中的应用机理、靶的结构、靶材的选取、提高膜层质量以及镀膜玻璃的应用及发展前景等问题。
On the basis of some principle trouble of coating glass, the application principle of magnetron sputtering, selection of target material are introduced, enhancement of the coating quality, application of the coated glass and development prospect are also given in this paper.
出处
《真空》
CAS
北大核心
2001年第1期18-22,共5页
Vacuum
