摘要
综述了脉冲激光沉积制备薄膜的原理、特点，国内外对脉冲激光沉积的研究应用情况及目前的最新研究方向．着重分析了脉冲激光沉积过程中各主要沉积条件，如激光能量密度、靶－基体距、真空室气压及基体温度等对薄膜质量的影响．
In this paper, we present the principle, characteristics, studies and applications and the latest development of the preparation of film by pulsed laser deposition. The principal parameters during pulsed laser deposition such as the energy density of laser, the distance between substrate and target, the gas pressure in the vacuum and the substrate temperature are analysed emphatically.
出处
《江苏理工大学学报（自然科学版）》
2001年第2期56-59,共4页
Journal of Jiangsu University of Science and Technology(Natural Science)
